Nikon If Not Then OST 3100
User Manual: Nikon If not then Manual: ://www.nikoninstruments.com/images/stories/PDFs/OST-3100
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OPTISTATION-3100 Wafer Inspection System OPTISTATION-3100 Compact solution for 300mm wafer inspection in diverse applications Compact solution for 300mm wafer inspection in diverse applications Engineered to provide cost-effective support for 300mm wafers with a minimal footprint, the OPTISTATION-3100 features a new Micro/Macro system in a compact, flexible design. A new optical system offers brighter images, and observation techniques can be programmed for each objective magnification and each substrate layer to be inspected. This eliminates deviation from the inspection protocol and missed information through incorrect optical technique. Its flexible design enables the load ports to be positioned in accordance with the fab layout requirements. Clearly the best choice for factory automation, the OPTISTATION-3100 is ideal for inspection in a production environment, advanced research and development, and failure analysis applications. OPTISTATION-3100 Main Features Specifications • New optics Nikon’s renowned CFI60 optics produce crisp, clear images with high contrast and minimal flare. Longer working distances throughout the magnification range ensure safer wafer inspection. The darkfield signal-to-background ratio is three times higher than in the past, ensuring significantly better imaging. • Newly designed DUV microscope The newly designed optional DUV microscope module offers resolution to 0.1µm, supporting present and future design rules. • Flexibility in load port positioning With load port positions available in the front, side and rear, the OPTISTATION-3100 is adaptable to diverse fab layouts and 300mm factory automation requirements. What’s more, it features a smaller footprint and compact design. • Contamination free inspection An integrated environmental chamber and FFU (fan filter unit) prevent contamination by particles, easily ensuring a class 1 inspection environment. • Easy operation Automated, motorized functions controlled by an easily accessible touchscreen ensure comfortable operation while minimizing contamination. Optimum observation settings, including aperture and light intensity, can be preset according to objective lens or wafer type. • Built for factory automation The OPTISTATION-3100 features a SEMI and SELETE compliant design to enable easy adaptation to diverse 300mm factory automation requirements. • 3-mode Macro inspection with high-performance illuminators Allows surface Macro, center backside Macro, and perimeter backside Macro inspections. Furthermore, the wide illuminator WIL-100 and the line illuminator LIL-100 have been newly developed to detect various process defects. Wafer size Microscope (micro) inspection Total magnification Inspection modes Autofocus Objectives Macro inspection Load port Wafer transfer Operation Options DUV microscope Online operation Communication with host computer Others Safety Ergonomic Dimensions (W x D x H) (Rear load port) Weight Main body FFU unit ø300mm 25x to 1,500x Brightfield, darkfield, DUV (option) LED illumination slit projection CFI60 objectives Surface Macro, center backside Macro, perimeter backside Macro 1 FOUP (or 1 FOSB: option) Position selectable from front, side or rear Robotic handling; vacuum chuck; noncontact pre-alignment mechanism Touch panel GUI, mouse, keyboard Switchable to B/D Via SECS-I or HSMS 300mm SEMI standards (Compliant with E5, E7, E30, E37, E39, E40, E87, E90, E94) FOSB compliance ULPA boronless FFU (fan filter unit) Video capture function 2nd user interface (UIF) OHV (SEMI E84 compliance) Review inspection ADC OCR S2-0200 compliance, CE marking compliance S8-1000 compliance 1,785 x 1,650 x 2,300mm (70.1 x 65.0 x 90.6 in.) Approx. 760kg (1,676 lbs.) Approx. 160kg (353 lbs.) The export of this product is controlled by the Japanese Foreign Exchange and Foreign Trade Law and international export control regime. It should not be exported without authorization from the appropriate governmental authorities. Specifications and equipment are subject to change without any notice or obligation on the part of the manufacturer. July 2003 ©2001 NIKON CORPORATION WARNING TO ENSURE CORRECT USAGE, READ THE CORRESPONDING MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT. NIKON INSTECH CO., LTD. NIKON INSTRUMENTS INC. Parale Mitsui Bldg., 8, Higashida-cho, Kawasaki-ku, Kawasaki, Kanagawa 210-0005, Japan phone: +81-44-223-2171 fax: +81-44-223-2159 E-mail: inspect.sokkenn@nikon.co.jp http://www.ave.nikon.co.jp/inst/ Semiconductor Inspection Technologies Group 1430 W. Auto Drive, Suite 101, Tempe, AZ 85284 phone: +1-480-403-4100, +1-877-4-SITECH (474-8324) Toll Free in U.S. fax: +1-480-403-4199 E-mail: info@nikonsitech.com http://www.nikonusa.com/ NIKON CORPORATION Instruments Company NIKON CORPORATION Yokohama Plant NIKON INSTRUMENTS EUROPE B.V. P.O. Box 222, 1170 AE Badhoevedorp, The Netherlands phone: +31-20-44-96-222 fax: +31-20-44-96-298 http://www.nikon-instruments.com/ NIKON CORPORATION Printed in Japan Code No. 2CE-KWWH-1 (0307-0.65) K http://www.nikon.com/ E
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