Nikon If Not Then OST 3200
User Manual: Nikon If not then Manual: ://www.nikoninstruments.com/images/stories/PDFs/OST-3200
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OPTISTATION-3200 Wafer Inspection System OPTISTATION-3200 Redefining 300mm wafer inspection with Nikon’s CFI60 optical design Redefining 300mm wafer inspection with Nikon’s CFI60 optical design Wafer Inspection System OPTISTATION-3200 Main Features Specifications • New optics Nikon’s renowned CFI60 optics produce crisp, clear images with high contrast and minimal flare. Longer working distances throughout the magnification range ensure safer wafer inspection. The darkfield signal-to-background ratio is three times higher than in the past, ensuring significantly better imaging. Type CFI LU Plan BD CFI LU Plan Apo BD Magnification 5X 10X 20X 50X 100X 150X N.A. 0.15 0.30 0.45 0.80 0.90 0.90 W.D. (mm) 18.00 15.00 4.50 1.00 1.00 0.42 • Newly designed DUV microscope The newly designed DUV microscope module supports 90nm and future design rules. • Review inspection with ADC State-of-the-art image processing and analysis technology ensures accurate defect detection. The user-friendly software allows for easy setup and operation. • Flexibility in load port positioning Two load ports are available in the side or rear, making the OPTISTATION-3200 adaptable to diverse fab layouts and 300mm factory automation requirements. • 3-mode Macro inspection with high-performance illuminators Allows surface Macro, center backside Macro, and perimeter backside Macro inspections. The newly developed wide (WIL-100) and line (LIL-100) illuminators offer wavelength and lighting techniques to easily detect a variety of process defects. • Easy operation by touch screen Automated and motorized functions are controlled by an easily accessible touchscreen to ensure comfortable operation while minimizing contamination. Optimum observation settings, including aperture and light intensity, can be preset according to objective lens or wafer type. WARNING Wafer size Microscope (micro) inspection Total magnification Inspection modes Autofocus Objectives Macro inspection Load port Wafer transfer Operation Options DUV microscope Online operation Others Safety Ergonomic Dimensions (W x D x H) (Rear load port) ø300mm 25x to 1,500x Brightfield, Darkfield, DIC (option), DUV (option) LED illumination slit projection CFI60 objectives Surface Macro, center backside Macro, perimeter backside Macro 2 FOUP Position selectable from side or rear Robotic handling; vacuum chuck; noncontact pre-alignment mechanism Touch panel GUI, mouse, keyboard Hg-Xe lamp type (248nm) Via SECS-I or HSMS Video capture function 2nd user interface (UIF) OHV (SEMI E84 compliance) Review inspection ADC OCR S2-0302 compliance, CE marking compliance S8-0701 compliance 1,625 x 2,500 x 2,300mm (64.0 x 98.4 x 90.6 in.) TO ENSURE CORRECT USAGE, READ THE CORRESPONDING MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT. The export of this product is controlled by the Japanese Foreign Exchange and Foreign Trade Law and international export control regime. It should not be exported without authorization from the appropriate governmental authorities. Specifications and equipment are subject to change without any notice or obligation on the part of the manufacturer. July 2003 ©2003 NIKON CORPORATION NIKON INSTECH CO., LTD. NIKON INSTRUMENTS INC. Parale Mitsui Bldg., 8, Higashida-cho, Kawasaki-ku, Kawasaki, Kanagawa 210-0005, Japan phone: +81-44-223-2171 fax: +81-44-223-2159 E-mail: inspect.sokkenn@nikon.co.jp http://www.ave.nikon.co.jp/inst/ Semiconductor Inspection Technologies Group 1430 W. Auto Drive, Suite 101, Tempe, AZ 85284 phone: +1-480-403-4100, +1-877-4-SITECH (474-8324) Toll Free in U.S. fax: +1-480-403-4199 E-mail: info@nikonsitech.com http://www.nikonusa.com/ NIKON CORPORATION Instruments Company NIKON CORPORATION Yokohama Plant NIKON INSTRUMENTS EUROPE B.V. P.O. Box 222, 1170 AE Badhoevedorp, The Netherlands phone: +31-20-44-96-222 fax: +31-20-44-96-298 http://www.nikon-instruments.com/ NIKON CORPORATION Printed in Japan Code No. 2CE-KVBH-1 (0307-01) K http://www.nikon.com/ E
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