Nikon If Not Then OST 3200

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Wafer Inspection System

OP T I STAT ION-3200

Redefining 300mm wafer

inspection with Nikon’s

CFI60 optical design

OPTISTATION-3200

Redefining 300mm wafer inspection with Nikon’s CFI60 optical design

Wafer size ø300mm

Microscope (micro)

inspection

Total magnification 25x to 1,500x

Inspection modes Brightfield, Darkfield, DIC (option),

DUV (option)

Autofocus LED illumination slit projection

Objectives CFI60 objectives

Macro inspection Surface Macro, center backside Macro,

perimeter backside Macro

Load port 2 FOUP

Position selectable from side or rear

Wafer transfer Robotic handling; vacuum chuck;

noncontact pre-alignment mechanism

Operation Touch panel GUI, mouse, keyboard

Options

DUV microscope Hg-Xe lamp type (248nm)

Online operation Via SECS-I or HSMS

Others Video capture function

2nd user interface (UIF)

OHV (SEMI E84 compliance)

Review inspection

ADC

OCR

Safety S2-0302 compliance, CE marking

compliance

Ergonomic S8-0701 compliance

Dimensions (W x D x H)

1,625 x 2,500 x 2,300mm

(Rear load port) (64.0 x 98.4 x 90.6 in.)

Specifications

Main Features

• New optics

Nikon’s renowned CFI60 optics produce crisp, clear images with

high contrast and minimal flare. Longer working distances

throughout the magnification range ensure safer wafer inspection.

The darkfield signal-to-background ratio is three times higher than

in the past, ensuring significantly better imaging.

• Newly designed DUV microscope

The newly designed DUV microscope module supports 90nm and

future design rules.

• Review inspection with ADC

State-of-the-art image processing and analysis technology ensures

accurate defect detection. The user-friendly software allows for easy

setup and operation.

• Flexibility in load port positioning

Two load ports are available in the side or rear, making the

OPTISTATION-3200 adaptable to diverse fab layouts and 300mm

factory automation requirements.

• 3-mode Macro inspection with high-performance illuminators

Allows surface Macro, center backside Macro, and perimeter

backside Macro inspections. The newly developed wide (WIL-100)

and line (LIL-100) illuminators offer wavelength and lighting

techniques to easily detect a variety of process defects.

• Easy operation by touch screen

Automated and motorized functions are controlled by an easily

accessible touchscreen to ensure comfortable operation while

minimizing contamination. Optimum observation settings, including

aperture and light intensity, can be preset according to objective lens

or wafer type.

Wafer Inspection System OPTISTATION-3200

WARNING

NIKON INSTECH CO., LTD.

Parale Mitsui Bldg., 8, Higashida-cho, Kawasaki-ku,

Kawasaki, Kanagawa 210-0005, Japan

phone: +81-44-223-2171 fax: +81-44-223-2159

E-mail: inspect.sokkenn@nikon.co.jp

http://www.ave.nikon.co.jp/inst/

NIKON INSTRUMENTS EUROPE B.V.

P.O. Box 222, 1170 AE Badhoevedorp, The Netherlands

phone: +31-20-44-96-222 fax: +31-20-44-96-298

http://www.nikon-instruments.com/

NIKON INSTRUMENTS INC.

Semiconductor Inspection Technologies Group

1430 W. Auto Drive, Suite 101, Tempe, AZ 85284

phone: +1-480-403-4100, +1-877-4-SITECH (474-8324) Toll Free in U.S.

fax: +1-480-403-4199

E-mail: info@nikonsitech.com

http://www.nikonusa.com/

The export of this product is controlled by the Japanese Foreign Exchange and

Foreign Trade Law and international export control regime. It should not be exported

without authorization from the appropriate governmental authorities.

Specifications and equipment are subject to change without any notice or obligation

on the part of the manufacturer. July 2003

©2003 NIKON CORPORATION

Printed in Japan Code No. 2CE-KVBH-1 (0307-01) K E

NIKON CORPORATION

Yokohama Plant

NIKON CORPORATION

Instruments Company

TO ENSURE CORRECT USAGE, READ THE CORRESPONDING MANUALS CAREFULLY BEFORE USING YOUR EQUIPMENT.

NIKON CORPORATION http://www.nikon.com/

Type Magnification N.A. W.D. (mm)

CFI LU Plan BD 5X 0.15 18.00

10X 0.30 15.00

20X 0.45 4.50

50X 0.80 1.00

100X 0.90 1.00

CFI LU Plan Apo BD 150X 0.90 0.42